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Intel funds EUV lithography development

Intel on Monday said it will provide Cymer with $20 million over the next three years to accelerate development of light sources for extreme ultraviolet (EUV) lithography. EUV lithography, which arose out of a joint development agreement between a number of semiconductor manufacturers and Lawrence Livermore National Laboratories, will allow chipmakers to "draw" much finer circuits than is possible on current equipment. Drawing those circuits, however, requires extremely precise mirrors and powerful light sources. Experimental EUV systems used a light source based on technology from the old "Star Wars" program.

Cymer makes light sources for lithography systems. Originally expected around 2007, EUV is now slated for a commercial launch in 2009.